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Full-level alternating PSM for sub-100nm DRAM gate patterning

Author(s):
Pforr, R. ( Infineon Technologies AG (Germany) )
Ahrens, M. ( Infineon Technologies AG (Germany) )
Dettmann, W. ( Infineon Technologies AG (Germany) )
Hennig, M. ( Infineon Technologies AG (Germany) )
Koehle, R. ( Infineon Technologies AG (Germany) )
Ludwig, B. ( Infineon Technologies AG (Germany) )
Morgana, N. ( Infineon Technologies AG (Germany) )
Thiele, J. ( Infineon Technologies AG (Germany) )
3 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. date:
2003
Vol.:
Part One
Page(from):
232
Page(to):
243
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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