Optimizing and enhancing optical systems to meet the low k1 challenge
- Author(s):
Flagello, D.G. ( ASML (USA) ) Socha, R.J. ( ASML (USA) ) Shi, X. ( ASML (USA) ) Schoot, J.B. ( ASML (Netherlands) ) Baselmans, J. ( ASML (Netherlands) ) Kerkhof, M.A. ( ASML (Netherlands) ) Boeij, W. ( ASML (Netherlands) ) Engelen, A. ( ASML (Netherlands) ) Carpaij, R. ( ASML (Netherlands) ) Noordman, O. ( ASML (Netherlands) ) Moers, M.H.P. ( ASML (Netherlands) ) Mulder, M. ( ASML (Netherlands) ) Finders, J. ( ASML (Netherlands) ) Greevenbroek, H. ( ASML (Netherlands) ) Schriever, M. ( Carl Zeiss SMT AG (Germany) ) Maul, M. ( Carl Zeiss SMT AG (Germany) ) Haidner, H. ( Carl Zeiss SMT AG (Germany) ) Goeppert, M. ( Carl Zeiss SMT AG (Germany) ) Wegmann, U. ( Carl Zeiss SMT AG (Germany) ) Graeupner, P. ( Carl Zeiss SMT AG (Germany) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 139
- Page(to):
- 150
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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