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Impact of wavefront errors on low k1 processes at extremely high NA

Author(s):
Graeupner, P. ( Carl Zeiss SMT AG (Germany) )
Garreis, R.B. ( Carl Zeiss SMT AG (Germany) )
Goehnermeier, A. ( Carl Zeiss SMT AG (Germany) )
Heil, T. ( Carl Zeiss SMT AG (Germany) )
Lowisch, M. ( Carl Zeiss SMT AG (Germany) )
Flagello, D.G. ( ASML (USA) )
1 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part One
Page(from):
119
Page(to):
130
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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