Rinse liquid to improve pattern collapse behavior
- Author(s):
Lee, G. ( Hynix Semiconductor, Inc. (South Korea) ) Lee, S.-K. ( Hynix Semiconductor, Inc. (South Korea) ) Hwang, Y.-S. ( Hynix Semiconductor, Inc. (South Korea) ) Jung, J.-C. ( Hynix Semiconductor, Inc. (South Korea) ) Bok, C. ( Hynix Semiconductor, Inc. (South Korea) ) Moon, S.-C. ( Hynix Semiconductor, Inc. (South Korea) ) Shin, K.-S. ( Hynix Semiconductor, Inc. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 1416
- Page(to):
- 1424
- Pages:
- 9
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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