Fabrication of integrated circuits with high yield using ultra-thin resist processes

Fabrication of integrated circuits with high yield using ultra-thin resist processes

Author(s):

Peters, R.D. ( Motorola Digital DNA Labs. (USA) )

Postnikov, S.V. ( Motorola Digital DNA Labs. (USA) )

Cobb, J.L. ( Motorola Digital DNA Labs. (USA) )

Dakshina-Murthy, S. ( Advanced Micro Devices,INC. (USA) )

Stephens, T. ( Motorola Digital DNA Labs. (USA) )

Parker, C. ( Motorola Digital DNA Labs. (USA) )

Luckowski, E. ( Motorola Digital DNA Labs. (USA) )

Martinez, A.M. Jr., ( Motorola Digital DNA Labs. (USA) )

Wu, W. ( Motorola Digital DNA Labs. (USA) )

Hector, S.D. ( Motorola Digital DNA Labs. (USA) )

5 more

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

2

Pt.:

Poster Session

Page(from):

1390

Page(to):

1401

Pages:

12

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Poster Session ; 5039-164

Similar Items:

1 Conference Proceedings Integration of UTR processes into MPU IC manufacturing flows Cobb, J.L., Dakshina-Murthy, S., Parker, C., Luckowski, E., Martinez, A.M., Peters, R.D., Wu, W., Hector, S.D. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Development and characterization of 193-nm ultra-thin resist process Amblard, G.R., Peters, R., Cobb, J.L., Edamatsu, K. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Controlling line-edge rougness to within reasonable limits Cobb, J.L., Rauf, S., Thean, A., Dakshina-Murthy, S., Stephens, T., Parker, C., Peters, R.D., Rao, V. SPIE-The International Society for Optical Engineering	8 Conference Proceedings METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination Zhu, Z., Lucas, K.D., Cobb, J.L., Hector, S.D., Strojwas, A.J. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Integration of ultrathin resist processes into MPU IC manufacturing flows Cobb,J.L., Conley,W., Guenther,T., Huang,F., Lee,J.J., Lii,T., Dakshina-Murthy,S., Parker,C., Usmani,S., Wu,W., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Bremsstrahlung emission and absorption in electron projection lithography Hector,S.D., Cobb,J.L., Ivin,V., Silakov,M.V., Babushkin,G. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets Hector, S.D., Postnikov, S.V., Cobb, J. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Rigorous EUV mask simulator using 2D and 3D waveguide methods Zhu, Z., Lucas, K., Cobb, J.L., Hector, S.D., Strojwas, A.J. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Single-layer and bilayer resist processes for EUV-type integrations Peters, R.D., Parker, C., Cobb, J., Luckowski, E., Weisbrod, E., Dauksher, B. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection Han, S.-I., Wasson, J.R., Mangat, P.J.S., Cobb, J.L., Lucas, K., Hector, S.D. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Process latitude measurements and their implications for CD control in EUV lithography Cobb, J., Peters, R., Postnikov, S., Hector, S.D., Lu, B., Weisbrod, E., Wasson, J.R., Mangat, P., O'Connell, D. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Line-edge roughness reduction and CD slimming using hardback processing Peters, R.D., Lucas, K., Cobb, J.L., Parker, C., Patterson, K., McCauley, R., Ercken, M., Roey, F.V., Vandenbroeck, N., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12