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Characterization of resist flow process for the improvement of contact hole CD uniformity

Author(s):
  • Koh, C.-W. ( Hynix Semiconductor, Inc. (South Korea) )
  • Lee, D.-H. ( Hynix Semiconductor, Inc. (South Korea) )
  • Kim, M.-S. ( Hynix Semiconductor, Inc. (South Korea) )
  • Park, S.-N. ( Hynix Semiconductor, Inc. (South Korea) )
  • Kwon, W.-T. ( Hynix Semiconductor, Inc. (South Korea) )
Publication title:
Advances in resist technology and processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. date:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1382
Page(to):
1389
Pages:
8
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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