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Improvement of pattern collapse issue by additive-added D.I. water rinse process

Author(s):
Tanaka, K. ( Tokyo Electron Kyushu Ltd. (Japan) )
Naito, R. ( Tokyo Electron Kyushu Ltd. (Japan) )
Kitada, T. ( Tokyo Electron FE Ltd. (Japan) )
Kiba, Y. ( Tokyo Electron Kyushu Ltd. (Japan) )
Yamada, Y. ( Tokyo Electron Kyushu Ltd. (Japan) )
Kobayashi, M. ( Clariant Japan K.K. (Japan) )
Ichikawa, H. ( Clariant Japan K.K. (Japan) )
2 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1366
Page(to):
1381
Pages:
16
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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