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Critical dimension (CD) control in 157-nm lithography

Author(s):
Hori, S. ( Tokyo Electron Kyushu Ltd. (Japan) )
Yoshihara, K. ( Tokyo Electron Kyushu Ltd. (Japan) )
Kyoda, H. ( Tokyo Electron Kyushu Ltd. (Japan) )
Matsui, H. ( Tokyo Electron Ltd. (Japan) )
Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
3 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1333
Page(to):
1342
Pages:
10
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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