Improvement of pattern collapse in sub-100 nm nodes
- Author(s):
Jung, M.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 1298
- Page(to):
- 1303
- Pages:
- 6
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
New approach for pattern collapse problem by increasing contact area at sub-100nm patterning
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Advanced module-based approach to effective CD prediction of sub-100nm patterns
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Strategy for sub-80-nm contact hole patterning considering device fabrication
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Successful application of angular scatterometry to process control in sub-100-nm DRAM device
SPIE - The International Society of Optical Engineering |