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Novel silicon-containing polymers as photoresist materials for EUV lithography

Author(s):
Kwark, Y.-J. ( Cornell Univ. (USA) )
Bravo-Vasquez, J.-P. ( Cornell Univ. (USA) )
Ober, C.K. ( Cornell Univ. (USA) )
Cao, H.B. ( Intel Corp. (USA) )
Deng, H. ( Intel Corp. (USA) )
Meagley, R.P. ( Intel Corp. (USA) )
1 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1204
Page(to):
1211
Pages:
8
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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