High-sensitivity nanocomposite resist materials for x-ray and EUV lithography

High-sensitivity nanocomposite resist materials for x-ray and EUV lithography

Author(s):

Ali, M.A. ( Univ. of North Carolina/Charlotte (USA) )
Gonsalves, K.E. ( Univ. of North Carolina/Charlotte (USA) )
Batina, N. ( Univ. Autonoma Metropolitana Iztapalapa (Mexico) )
Golovkina, V. ( Univ. of Wisconsin/Madison (USA) )
Cerrina, F. ( Univ. of Wisconsin/Madison (USA) )

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

2

Pt.:

Poster Session

Page(from):

1173

Page(to):

1180

Pages:

8

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Poster Session ; 5039-136

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