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Effects of quencher ability on profile in chemically amplified resist system

Author(s):
Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, H.-J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Cho, S.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, D.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Im, K.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Yoo, M.-J. ( Dongjin Semichem Co., Ltd (South Korea) )
Lee, S.-H. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd (South Korea) )
Kim, J.-S. ( Hynix Semiconductor, Inc. (South Korea) )
Kim, H.-S. ( Hynix Semiconductor, Inc. (South Korea) )
5 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
1086
Page(to):
1097
Pages:
12
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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