Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry
- Author(s):
Burns, S.D. ( Univ. of Texas at Austin (USA) ) Schmid, G.M. ( Univ. of Texas at Austin (USA) ) Trinque, B.C. ( Univ. of Texas at Austin (USA) ) Willson, J. ( Univ. of Texas at Austin (USA) ) Wunderlich, J. ( Univ. of Texas at Austin (USA) ) Tsiartas, P.C. ( Univ. of Texas at Austin (USA) ) Taylor, J.C. ( Univ. of Texas at Austin (USA) ) Burns, R.L. ( Univ. of Texas at Austin (USA) ) Wilson, C.G. ( Univ. of Texas at Austin (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 1063
- Page(to):
- 1075
- Pages:
- 13
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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