Thin film type 248-nm bottom antireflective coatings
- Author(s):
Enomoto, T. ( Nissan Chemical Industries, Ltd. (Japan) ) Nakayama, K. ( Nissan Chemical Industries, Ltd. (Japan) ) Mizusawa, K. ( Nissan Chemical Industries, Ltd. (Japan) ) Nakajima, Y. ( Nissan Chemical Industries, Ltd. (Japan) ) Yoon, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) , ( Samsung Electronics Co., Ltd. (North Korea) ) Chung, H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chon, S.M. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 910
- Page(to):
- 919
- Pages:
- 10
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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