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Resist reflow for 193-nm low-K1 lithography contacts

Author(s):
Montgomery, P.K. ( Motorola Digital DNA Labs. )
Lucas, K. ( Motorola Advanced Products R&D Lab. (USA) )
Strozewski, K.J. ( Motorola Advanced Products R&D Lab. (USA) )
Zavyalova, L. ( Motorola Advanced Products R&D Lab. (USA) )
Grozev, G. ( Arch Chemicals, Inc. (USA) )
Reybrouck, M. ( Arch Chemicals, Inc. (USA) )
Tzviatkov, P. ( Arch Chemicals, Inc. (USA) )
Maenhoudt, M. ( IMEC (Belgium) )
3 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
807
Page(to):
816
Pages:
10
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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