Performance of imide and methide onium PAGs in 193-nm resist formulations
- Author(s):
Padmanaban, M. ( Clariant Corp. (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Lee, S.H. ( Clariant Corp. (USA) ) Kim, W.-K. ( Clariant Corp. (USA) ) Kudo, T. ( Clariant Corp. (USA) ) McKenzie, D.S. ( Clariant Corp. (USA) ) Rahman, D. ( Clariant Corp. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 743
- Page(to):
- 751
- Pages:
- 9
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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