Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
- Author(s):
Joo, H.-S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Jeon, H.P. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) ) Jung, J.C. ( Hynix Semiconductor, Inc. (South Korea) ) Shin, K.S. ( Hynix Semiconductor, Inc. (South Korea) ) Bok, C.K. ( Hynix Semiconductor, Inc. (South Korea) ) Moon, S.-C. ( Hynix Semiconductor, Inc. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 725
- Page(to):
- 732
- Pages:
- 8
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Physico-chemical properties of polymers for 193-nm lithography incorporating alicyclic norbornene-alt-maleic anhydride structures
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
193-nm chemically amplified positive resists based on poly(norbornene-alt-maleic anhydride)with plasticizing additives
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
SPIE - The International Society of Optical Engineering |