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Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Author(s):
Joo, H.-S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Jeon, H.P. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )
Jung, J.C. ( Hynix Semiconductor, Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor, Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor, Inc. (South Korea) )
Moon, S.-C. ( Hynix Semiconductor, Inc. (South Korea) )
7 more
Publication title:
Advances in resist technology and processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. date:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
725
Page(to):
732
Pages:
8
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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