Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Author(s):

Joo, H.-S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Jeon, H.P. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Jung, J.C. ( Hynix Semiconductor, Inc. (South Korea) )

Shin, K.S. ( Hynix Semiconductor, Inc. (South Korea) )

Bok, C.K. ( Hynix Semiconductor, Inc. (South Korea) )

Moon, S.-C. ( Hynix Semiconductor, Inc. (South Korea) )

7 more

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

2

Pt.:

Poster Session

Page(from):

725

Page(to):

732

Pages:

8

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Poster Session ; 5039-81

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