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Nonshrinkable photoresists for ArF lithography

Author(s):
  • Kim, J.-B. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Oh, T.H. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Choi, J.-H. ( Korea Advanced Institute of Science and Technology (South Korea) )
  • Lee, J.-J. ( Samsung Advanced Institute of Technology (South Korea) )
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
689
Page(to):
697
Pages:
9
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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