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Newly developed alternating-copolymer-based silicon containing resists for sub-100-nm pattern fabrication

Author(s):
Publication title:
Advances in resist technology and processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. date:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
672
Page(to):
681
Pages:
10
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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