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A HFIPS-based polymer approach for 157-nm single layer photoresist

Author(s):
Kanna, S. ( Fuji Photo Film Co., Ltd. (Japan) )
Mizutani, K. ( Fuji Photo Film Co., Ltd. (Japan) )
Yasunami, S. ( Fuji Photo Film Co., Ltd. (Japan) )
Kawabe, Y. ( Fuji Photo Film Co., Ltd. (Japan) )
Tan, S. ( Fuji Photo Film Co., Ltd. (Japan) )
Yagihara, M. ( Fuji Photo Film Co., Ltd. (Japan) )
Kokubo, T. ( Fujifilm Arch Co., Ltd. (Japan) )
Malik, S. ( Arch Chemicals Inc. (USA) )
Dilocker, S.J. ( Arch Chemicals Inc. (USA) )
4 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
1
Pt.:
Poster Session
Page(from):
612
Page(to):
621
Pages:
10
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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