Ultrathin photoresists for 193-nm lithography

Ultrathin photoresists for 193-nm lithography

Author(s):

Peters, R.D. ( Motorola Digital DNA Labs. (USA) )
Amblard, G.R. ( Advanced Micro Devices, Inc. (USA) )
Lee, J.-J. ( Motorola Digital DNA Labs. (USA) )
Guenther, T. ( Motorola Digital DNA Labs. (USA) )

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

1

Pt.:

Session 9

Page(from):

393

Page(to):

403

Pages:

11

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Session 9. Resist Line Edge Roughness ; 5039-43

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