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Controlling line-edge rougness to within reasonable limits

Author(s):
Cobb, J.L. ( Motorola Digital DNA Labs. (USA) )
Rauf, S. ( Motorola Digital DNA Labs. (USA) )
Thean, A. ( Motorola Digital DNA Labs. (USA) )
Dakshina-Murthy, S. ( Advanced Micro Devices, Inc. (USA) )
Stephens, T. ( Motorola Digital DNA Labs. (USA) )
Parker, C. ( Motorola Digital DNA Labs. (USA) )
Peters, R.D. ( Motorola Digital DNA Labs. (USA) )
Rao, V. ( Motorola Digital DNA Labs. (USA) )
3 more
Publication title:
Advances in Resist Technology and Processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. Year:
2003
Vol.:
1
Pt.:
Session 9
Page(from):
376
Page(to):
383
Pages:
8
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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