Intel benchmarking and process integration of 157-nm resists

Intel benchmarking and process integration of 157-nm resists

Author(s):

Powers, J.M. ( Intel Corp. (USA) )

Roberts, J.M. ( Intel Corp. (USA) )

Zimmerman, P.A. ( International SEMATECH (USA) )

Meagley, R.P. ( Intel Corp. (USA) )

Putna, E.S. ( Intel Corp. (USA) )

Shah, U. ( Intel Corp. (USA) )

1 more

Publication title:

Advances in Resist Technology and Processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. Year:

2003

Vol.:

1

Pt.:

Session 7

Page(from):

269

Page(to):

276

Pages:

8

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Session 7. Advanced Resist Processing ; 5039-30

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