High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities
- Author(s):
Khojasteh, M. ( IBM Microelectronics Div. (USA) ) Chen, K.R. ( IBM Microelectronics Div. (USA) ) Kwong, R.W. ( IBM Microelectronics Div. (USA) ) Lawson, M.C. ( IBM Microelectronics Div. (USA) ) Varanasi, P.R. ( IBM Microelectronics Div. (USA) ) Patel, K.S. ( IBM Microelectronics Div. (USA) ) Kobayashi, E. ( JSR Microelectronics (Japan) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 5
- Page(from):
- 187
- Page(to):
- 194
- Pages:
- 8
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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