New approach for pattern collapse problem by increasing contact area at sub-100nm patterning
- Author(s):
Lee, S.-K. ( Hynix Semiconductor, Inc. (South Korea) ) Jung, J.C. ( Hynix Semiconductor, Inc. (South Korea) ) Lee, M.S. ( Hynix Semiconductor, Inc. (South Korea) ) Lee, S.K. ( Hynix Semiconductor, Inc. (South Korea) ) Kim, S.Y. ( Hynix Semiconductor, Inc. (South Korea) ) Hwang, Y.-S. ( Hynix Semiconductor, Inc. (South Korea) ) Bok, C.K. ( Hynix Semiconductor, Inc. (South Korea) ) Moon, S.-C. ( Hynix Semiconductor, Inc. (South Korea) ) Shin, K.S. ( Hynix Semiconductor, Inc. (South Korea) ) Kim, S.-J. ( Dongjin Semichem Co. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 4
- Page(from):
- 166
- Page(to):
- 174
- Pages:
- 9
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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