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Single layer fluropolymer resists for 157-nm lithography

Author(s):
Crawford, M.K. ( DuPont Co. (USA) )
Farnham, W.B. ( DuPont Co, (USA) )
Feiring, A.E. ( Dupont Co. (USA) )
Feldman, J. ( DuPont Co. (USA) )
French, R.H. ( DuPont Co. (USA) )
Leffew, K.W. ( DuPont Co (USA) )
Petrov, V.A. ( DuPont Co. (USA) )
Qiu, W. ( DuPont Co. (USA) )
Schadt, F.L. ( DuPont Co. (USA) )
Tran, H.V. ( DuPont Co. (USA) )
Wheland, R.C. ( DuPont Co. (USA) )
Zumsteg, F.C. Jr., ( DuPont Co. (USA) )
7 more
Publication title:
Advances in resist technology and processing XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5039
Pub. date:
2003
Vol.:
1
Pt.:
Session 3
Page(from):
80
Page(to):
92
Pages:
13
Pub. info.:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
Language:
English
Call no.:
P63600/5039
Type:
Conference Proceedings

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