Single layer fluropolymer resists for 157-nm lithography

Single layer fluropolymer resists for 157-nm lithography

Author(s):

Crawford, M.K. ( DuPont Co. (USA) )

Farnham, W.B. ( DuPont Co, (USA) )

Feiring, A.E. ( Dupont Co. (USA) )

Feldman, J. ( DuPont Co. (USA) )

French, R.H. ( DuPont Co. (USA) )

Leffew, K.W. ( DuPont Co (USA) )

Petrov, V.A. ( DuPont Co. (USA) )

Qiu, W. ( DuPont Co. (USA) )

Schadt, F.L. ( DuPont Co. (USA) )

Tran, H.V. ( DuPont Co. (USA) )

Wheland, R.C. ( DuPont Co. (USA) )

Zumsteg, F.C. Jr., ( DuPont Co. (USA) )

7 more

Publication title:

Advances in resist technology and processing XX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5039

Pub. date:

2003

Vol.:

1

Pt.:

Session 3

Page(from):

80

Page(to):

92

Pages:

13

Pub. info.:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

Language:

English

Call no.:

P63600/5039

Type:

Conference Proceedings

Details

TDL ID:	ZA00013027
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Technology and Processing
Conf. info. (Number):	2003 : 20th
Conf. info. (Venue):	Santa Clara, CA
Conf. info. (Date):	2003.02.24-2003.02.26
Note for article:	Session 3. Materials for 157-nm Resists II ; 5039-09

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