Rational design in cyclic olefin resists for sub-100-nm lithography
- Author(s):
Li, W. ( IBM Microelectronics Div. (USA) ) Varanasi, P.R. ( IBM Microelectronics Div. (USA) ) Lawson, M.C. ( IBM Microelectronics Div. (USA) ) Kwong, R.W. ( IBM Microelectronics Div. (USA) ) Chen, K.-J. ( IBM Microelectronics Div. (USA) ) Ito, H. ( IBM Almaden Research Ctr. (USA) ) Truong, H.D. ( IBM Almaden Research Ctr. (USA) ) Allen, R.D. ( IBM Almaden Research Ctr. (USA) ) Yamamoto, M. ( JSR Corp. (Japan) ) Kobayashi, E. ( JSR Corp. (Japan) ) Slezak, M. ( JSR Micro, Inc. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5039
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 2
- Page(from):
- 61
- Page(to):
- 69
- Pages:
- 9
- Pub. info.:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- Language:
- English
- Call no.:
- P63600/5039
- Type:
- Conference Proceedings
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