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Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography

Author(s):
Kim, Y.-S. ( Hynix Semiconductor Inc. (South Korea) )
You, T.J. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J.-S. ( Hynix Semiconductor Inc. (South Korea) )
Kim, S.-K. ( Hynix Semiconductor Inc. (South Korea) )
Kong, K.-K. ( Hynix Semiconductor Inc. (South Korea) )
Kim, Y.-D. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H.S. ( Hynix Semiconductor Inc. (South Korea) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
2
Page(from):
1107
Page(to):
1113
Pages:
7
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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