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Overlay performance with advanced ATHENA alignment strategies

Author(s):
Huijbregste, J. ( ASML (Netherlands) )
Haren, R.J.F. ( ASML (Netherlands) )
Jeunink, A. ( ASML (Netherlands) )
Hinnen, P.C. ( ASML (Netherlands) )
Swinnen, B. ( ASML (Netherlands) )
Navarro, R. ( ASML (Netherlands) )
Simons, G. ( ASML (Netherlands) )
Bilsen, F. ( ASML (Netherlands) )
Tolsma, H. ( ASML (Netherlands) )
Megens, H.J.L. ( ASML (Netherlands) )
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. date:
2003
Vol.:
2
Page(from):
918
Page(to):
928
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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