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Total process control of alignment and overlay for metal layer

Author(s):
  • Zhou, W. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Li, Z.Q. ( Chartered Semiconductor Manufacturing Ltd (Singapore) )
  • Ng, L.K.C. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Ng, T.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Lim, H.K. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
2
Page(from):
769
Page(to):
780
Pages:
12
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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