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New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring

Author(s):
Mayer, J.A. ( IBM (USA) )
Huizenga, K.J. ( IBM (USA) )
Solecky, E.P. ( IBM (USA) )
Archie, C.N. ( IBM (USA) )
Banke, G.W. Jr., ( IBM (USA) )
Cogley, R.M. ( IBM (USA) )
Nathan, C. ( IBM (USA) )
Robert, J.M. ( IBM Corp. (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
1
Page(from):
699
Page(to):
710
Pages:
12
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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