CD-SEM measurement line-edge roughness test patterns for 193-nm lithography
- Author(s):
- Bunday, B.D. ( International SEMATECH (USA) )
- Bishop, M. ( International SEMATECH (USA) )
- Villarrubia, J.S. ( National Institute of Standards and Technology (USA) )
- Vladar, A.E. ( National Institute of Standards and Technology (USA) )
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5038
- Pub. Year:
- 2003
- Vol.:
- 1
- Page(from):
- 674
- Page(to):
- 688
- Pages:
- 15
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- Language:
- English
- Call no.:
- P63600/5038
- Type:
- Conference Proceedings
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