Blank Cover Image

Application of scatterometry for CD and profile metrology in 193-nm lithography process development

Author(s):
Chen, L.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yu, S.S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, P. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ku, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Engelhard, D. ( Timbre Technologies, Inc. (USA) )
Hetzer, D. ( Timbre Technologies, Inc. (USA) )
Yang, J.Y. ( Timbre Technologies, Inc. (USA) )
Barry, K.A. ( Timbre Technologies, Inc. (USA) )
Yap, L. ( Timbre Technologies, Inc. (USA) )
Yang, W. ( Timbre Technologies, Inc. (USA) )
8 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. date:
2003
Vol.:
1
Page(from):
568
Page(to):
576
Pages:
9
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

Similar Items:

Ke, C.-M., Yu, S.-S., Wang, Y.-H., Chou, Y.-J., Chen, J.-H., Lee, B.-H., Chu, H.-Y., Lin, H.-T., Gau, T.-S., Lin, C.-H., …

SPIE - The International Society of Optical Engineering

Opsal, J.L., Leng, J., Ke, C.-M., Chen, P.-H., Chen, J.-H., Ku, Y.-C.

SPIE - The International Society of Optical Engineering

Ke, C.-M., Hung, H.-L., Chang, A., Chen, J.-H., Gau, T.-S., Ku, Y.-C., Lin, B.J., Otaka, T., Ueda, K., Kawada, H., …

SPIE - The International Society of Optical Engineering

8 Conference Proceedings Liquid immersion lithography at 157 nm

Chen, C.-K., Gau, T.-S., Shiu, L.-H., Lin, B. J.

SPIE - The International Society of Optical Engineering

Chen, L.-J., Lin, S.-W., Gau, T.-S., Lin, B.J.

SPIE-The International Society for Optical Engineering

Yedur, S., Vuong, V., Shivaprasad, D., Sarathy, T. P., Tabet, M., Korlahalli, R., Hu, J.

SPIE - The International Society of Optical Engineering

Lee, M. K., Yedur, S., Hetzer, D., Tavassoli, M., Baik, K.

SPIE - The International Society of Optical Engineering

Y. S. Ku, C. H. Tung, Y. P. Li, H. L. Pang, C. M. Ke, Y. H. Wang, D. C. Huang, N. P. Smith, L. Binns

SPIE - The International Society of Optical Engineering

Wang,Y.-Y., Lin,H.-T., Yu,S.-S., Chen,C.-K., Ku,Y.-C., Yen,A., Lin,B.J.

SPIE-The International Society for Optical Engineering

Ke, C.-M., Gau, T.-S., Chen, P.-H., Yen, A., Lin, B.J., Otaka, T., Iizumi, T., Sasada, K., Ueda, K.

SPIE-The International Society for Optical Engineering

6 Conference Proceedings OCD metrology by floating n/k

S. Yu, J. Huang, C. Ke, T. Gau, B. J. Lin, A. Yen, L. Lane, V. Vuong, Y. Chen

SPIE - The International Society of Optical Engineering

French, R. H., Qiu, W., Yang, M. K., Wheland, R. C., Lemon, M. F., Shoe, A. L., Adelman, D. J., Crawford, M. K., Tran, …

SPIE - The International Society of Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12