Electron beam metrology of 193-nm resists at ultralow voltage
- Author(s):
Sullivan, N.T. ( Schlumberger Semiconductor Solutions (USA) ) Dixson, R. ( International SEMATECH (USA) ) Bunday, B.D. ( International SEMATECH (USA) ) Mastovich, M.E. ( Schlumberger Semiconductor Solutions (USA) ) Knutrud, P.C. ( Schlumberger Semiconductor Solutions (USA) ) Fabre, P. ( Schlumberger Semiconductor Solutions (USA) ) Brandom, R. ( Schlumberger Semiconductor Solutions (USA) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5038
- Pub. Year:
- 2003
- Vol.:
- 1
- Page(from):
- 483
- Page(to):
- 492
- Pages:
- 10
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- Language:
- English
- Call no.:
- P63600/5038
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Applications of image diagnostics to metrology quality assurance and process control
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Low-impact resist metrology: the use of ultralow voltage for high-accuracy performance
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Secondary-electron image profiles using bias voltage technique in deep contact hole
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication
SPIE - The International Society for Optical Engineering |