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Electron beam metrology of 193-nm resists at ultralow voltage

Author(s):
Sullivan, N.T. ( Schlumberger Semiconductor Solutions (USA) )
Dixson, R. ( International SEMATECH (USA) )
Bunday, B.D. ( International SEMATECH (USA) )
Mastovich, M.E. ( Schlumberger Semiconductor Solutions (USA) )
Knutrud, P.C. ( Schlumberger Semiconductor Solutions (USA) )
Fabre, P. ( Schlumberger Semiconductor Solutions (USA) )
Brandom, R. ( Schlumberger Semiconductor Solutions (USA) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. date:
2003
Vol.:
1
Page(from):
483
Page(to):
492
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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