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Performance study of new segmented overlay marks for advanced wafer processing

Author(s):
Adel, M.E. ( KLA-Tencor Corp. (Israel) )
Allgair, J.A. ( Motorola, Inc. (USA) )
Benoit, D.C. ( Motorola, Inc. (USA) )
Ghinovker, M. ( KLA-Tencor Corp. (USA) )
Kassel, E. ( KLA-Tencor Corp. (USA) )
Nelson, C. ( KLA-Tencor Corp. (USA) )
Robinson, J.C. ( KLA-Tencor Corp. (USA) )
Seligman, G.S. ( Motorola, Inc. (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
1
Page(from):
453
Page(to):
463
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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