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CD control at low K1 optical lithography in DRAM device

Author(s):
Hong, J. ( Hynix Semiconductor Inc. (South Korea) )
Woo, C. ( Hynix Semiconductor Inc. (South Korea) )
Park, J. ( Hynix Semiconductor Inc. (South Korea) )
Cho, B. ( Hynix Semiconductor Inc. (South Korea) )
Choi, J.-S. ( Hynix Semiconductor Inc. (South Korea) )
Yang, H. ( Hynix Semiconductor Inc. (South Korea) )
Park, C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, Y.-C. ( Hynix Semiconductor Inc. (South Korea) )
Kim, Y. ( Hynix Semiconductor Inc. (South Korea) )
Jeong, G. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
Kang, K. ( Hynix Semiconductor Inc. (South Korea) )
Kang, C. ( Hynix Semiconductor Inc. (South Korea) )
Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
Song, Y. ( Hynix Semiconductor Inc. (South Korea) )
10 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. Year:
2003
Vol.:
1
Page(from):
406
Page(to):
414
Pages:
9
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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