Novel diffraction-based spectroscopic method for overlay metrology

Novel diffraction-based spectroscopic method for overlay metrology

Author(s):

Yang, W. ( Nanometrics Inc. (USA) )

Lowe-Webb, R. ( Nanometrics Inc. (USA) )

Rabello, S. ( Nanometrics Inc. (USA) )

Hu, J. ( Nanometrics, Inc. (USA) )

Lin, J.-Y. ( Nanometrics Inc. (USA) )

Heaton, J.D. ( Nanometrics Inc. (USA) )

Dusa, M.V. ( ASML (USA) )

Boef, A.J. ( ASML (Netherlands) )

Schaar, M. ( ASML (Netherlands) )

Hunter, A. ( ASML (USA) )

5 more

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5038

Pub. Year:

2003

Vol.:

1

Page(from):

200

Page(to):

207

Pages:

8

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448439 [0819448435]

Language:

English

Call no.:

P63600/5038

Type:

Conference Proceedings

Details

TDL ID:	ZA00013025
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2003 : 17th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.24-2003.02.27
Note for article:	Scatterometry ; 5038-20

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