Overlay considerations for 300-mm lithography
- Author(s):
Mono, T. ( Infineon Technologies GmbH (Germany) ) Schroeder, U.P. ( Infineon Technologies GmbH (Germany) ) Nees, D. ( Infineon Technologies GmbH (Germany) ) Palitzsch, K. ( Infineon Technologies GmbH (Germany) ) Koestler, W. ( Infineon Technologies GmbH (Germany) ) Bruch, J. ( Infineon Technologies GmbH (Germany) ) Kramp, S. ( Infineon Technologies GmbH (Germany) ) Veldkamp, M. ( Infineon Technologies GmbH (Germany) ) Schuster, R. ( Infineon Technologies GmbH (Germany) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5038
- Pub. Year:
- 2003
- Vol.:
- 1
- Page(from):
- 121
- Page(to):
- 125
- Pages:
- 5
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- Language:
- English
- Call no.:
- P63600/5038
- Type:
- Conference Proceedings
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