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Calibration strategies for overlay and registration metrology

Author(s):
Silver, R.M. ( National Institute of Standards and Technology (USA) )
Stocker, M.T. ( National Institute of Standards and Technology (USA) )
Attota, R. ( National Institute of Standards and Technology (USA) )
Bishop, M. ( International SEMATECH (USA) )
Jun, J.-S.J. ( National Institute of Standards and Technology (USA) )
Marx, E. ( National Institute of Standards and Technology (USA) )
Davidson, M.P. ( Spectel Research Corp. (USA) )
Larrabee, R.D. ( National Institute of Standards and Technology (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5038
Pub. date:
2003
Vol.:
1
Page(from):
103
Page(to):
120
Pages:
18
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
Language:
English
Call no.:
P63600/5038
Type:
Conference Proceedings

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