Distortion management strategy for EPL reticle
- Author(s):
- Yamamoto, H. ( Nikon Corp. (Japan) )
- Aoyama, T. ( Nikon Corp. (Japan) )
- Hirayanagi, N. ( Nikon Corp. (Japan) )
- Suzuki, K. ( Nikon Corp. (Japan) )
- Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 2
- Pt.:
- Poster Session
- Page(from):
- 991
- Page(to):
- 998
- Pages:
- 8
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
High-accuracy aerial image measurement for electron-beam projection lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Predicting local thermomechanical distortions of the 200-mm EPL mask system
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |