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Subfield distortion of an EPL stencil mask

Author(s):
  • Takenaka, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Yamashita, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Koike, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Yamabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
962
Page(to):
971
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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