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Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling

Author(s):
Robertson, S.A. ( Shipley Co. L.L.C. (USA) )
Naulleau, P.P. ( Lawrence Berkeley National Lab. (USA) )
O'Connell, D.J. ( Sandia National Labs. (USA) )
McDonald, K. ( Sandia National Labs. (USA) )
Delano, T.M. ( Shipley Co. (USA) )
Goldberg, K.A. ( Lawrence Berkeley National Lab. (USA) )
Hansen, S.G. ( ASML (USA) )
Brown, K.W. ( Shipley Co. L.L.C. (USA) )
Brainard, R.L. ( Shipley Co. L.L.C. (USA) )
4 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
900
Page(to):
909
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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