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EUV mask stress mapping by an experimental and hybrid finite element technique

Author(s):
Feng, Z. ( Univ. of Wisconsin/Madison (USA) )
Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) )
Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) )
Mikkelson, A.R. ( Univ. of Wisconsin/Madison (USA) )
Reu, P.L. ( Univ. of Wisconsin/Madison (USA) )
Sohn, J. ( Univ. of Wisconsin/Madison (USA) )
Blaedel, K.L. ( Lawrence Livermore National Lab. (USA) )
Claudet, A.A. ( Lawrence Livermore National Lab. (USA) )
3 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
879
Page(to):
889
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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