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Extending a GTD-based image formation technique to EUV lithography

Author(s):
Khoh, A. ( Chartered Semiconductor Manufacturing (Singapore) )
Flagello, D.G. ( ASML (USA) )
Milster, T.D. ( Optical Sciences Ctr./Univ. of Arizona (USA) )
Choi, B.-I. ( Chartered Semiconductor Manufacturing (Singapore) )
Samudra, G.S. ( National Univ. of Singapore (Singapore) )
Wu, Y. ( National Univ. of Singapore (Singapore) )
1 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
682
Page(to):
689
Pages:
8
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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