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Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node

Author(s):
Nkano, H. ( Sony Corp. (Japan) )
Nohda, S. ( Sony Corp. (Japan) )
Oguni, K. ( Sony Corp. (Japan) )
Motohashi, T. ( Sony Corp. (Japan) )
Yoshizawa, M. ( Sony Corp. (Japan) )
Kitagawa, T. ( Sony Corp. (Japan) )
Moriya, S. ( Sony Corp. (Japan) )
2 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
2
Pt.:
Session 16
Page(from):
611
Page(to):
621
Pages:
11
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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