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EPL stencil mask defect inspection system using transmission electron beam

Author(s):
Yamamoto, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Iwasaki, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yamabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Anazawa, N. ( Holon Co., Ltd. (Japan) )
Maruyama, S. ( Tokyo Seimitsu Co., Ltd. (Japan) )
Tsuta, K. ( Tokyo Seimitsu Co., Ltd. (Japan) )
1 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
1
Pt.:
Session 14
Page(from):
531
Page(to):
537
Pages:
7
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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