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Reduction of image placement errors in EPL masks (Invited Paper)

Author(s):
II, O.R.W. ( International SEMATECH (USA) )
Reu, P.L. ( Univ. of Wisconsin/Madison (USA) )
Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) )
Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) )
Lercel, M.J. ( IBM Microelectronics Div. (USA) )
Thiel, C.W. ( IBM Microelectronics Div. (USA) )
Lawliss, M.S. ( IBM Microelectronics Div. (USA) )
Mackay, R.S. ( Photronics, Inc. (USA) )
3 more
Publication title:
Emerging Lithographic Technologies VII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5037
Pub. Year:
2003
Vol.:
1
Pt.:
Session 14
Page(from):
521
Page(to):
530
Pages:
10
Pub. info.:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448422 [0819448427]
Language:
English
Call no.:
P63600/5037
Type:
Conference Proceedings

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