Rigorous EUV mask simulator using 2D and 3D waveguide methods
- Author(s):
- Zhu, Z. ( Carnegie Mellon Univ. (USA) )
- Lucas, K. ( Motorola, Inc. (USA) )
- Cobb, J.L. ( Motorola, Inc. (USA) )
- Hector, S.D. ( Motorola, Inc. (USA) )
- Strojwas, A.J. ( Carnegie Mellon Univ. (USA) )
- Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 13
- Page(from):
- 494
- Page(to):
- 503
- Pages:
- 10
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Comparison of defect detection schemes using rigorous 3D EM field simulations
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Vendor capability for low-thermal-expansion mask substrates for EUV lithography
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
Thermal management of EUV lithography masks using low-expansion glass substrates
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Propagation of EM waves in axial symmetric structures and its implication for 3D rigorous lithography process simulation
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
A superfast 3D lithography simulator and its application for ULSI printability analysis
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |