Rigorous EUV mask simulator using 2D and 3D waveguide methods

Rigorous EUV mask simulator using 2D and 3D waveguide methods

Author(s):

Zhu, Z. ( Carnegie Mellon Univ. (USA) )
Lucas, K. ( Motorola, Inc. (USA) )
Cobb, J.L. ( Motorola, Inc. (USA) )
Hector, S.D. ( Motorola, Inc. (USA) )
Strojwas, A.J. ( Carnegie Mellon Univ. (USA) )

Publication title:

Emerging Lithographic Technologies VII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5037

Pub. Year:

2003

Vol.:

1

Pt.:

Session 13

Page(from):

494

Page(to):

503

Pages:

10

Pub. info.:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

Language:

English

Call no.:

P63600/5037

Type:

Conference Proceedings

Details

TDL ID:	ZA00013023
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2003 : 7th
Conf. info. (Venue):	Santa Clara, California, USA
Conf. info. (Date):	2003.02.25-2003.02.27
Note for article:	Session 13. Advanced Masks II ; 5037-63

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