Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
- Author(s):
Han, S.-I. ( Motorola, Inc. (USA) ) Weisbrod, E. ( Motorola, Inc. (USA) ) Xie, Q. ( Motorola, Inc. (USA) ) Mangat, P.J.S. ( Motorola, Inc. (USA) ) Hector, S.D. ( Motorola, Inc. (USA) ) Dauksher, W.J. ( Motorola, Inc. (USA) ) - Publication title:
- Emerging Lithographic Technologies VII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5037
- Pub. Year:
- 2003
- Vol.:
- 1
- Pt.:
- Session 9
- Page(from):
- 314
- Page(to):
- 330
- Pages:
- 17
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- Language:
- English
- Call no.:
- P63600/5037
- Type:
- Conference Proceedings
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